Hafnium Tetrachloride (HfCl₄)
🧪 Hafnium Tetrachloride (HfCl₄) – High-Purity Industrial Chemical
Our Hafnium Tetrachloride (HfCl₄) is a high-purity chemical precursor widely used in semiconductors, advanced metallurgy, chemical synthesis, and research applications. HfCl₄ is a volatile, hygroscopic, and highly reactive compound, essential for producing hafnium-based high-performance materials including HfO₂ films, hafnium alloys, and dielectric layers.
Key Features & Benefits
- Ultra-High Purity: HfCl₄ ≥ 99%, with minimal zirconium and other impurities.
- Industrial-Grade Quality: Meets stringent demands of semiconductor, aerospace, and metallurgy industries.
- Consistent Composition: Ensures precise, repeatable industrial processes.
- Safe Handling & Packaging: Supplied in vacuum-sealed, moisture-resistant containers.
Applications
| Industry / Sector | Applications & Uses |
|---|---|
| Semiconductor Industry | Precursor for HfO₂ films, insulating dielectric layers for MOSFETs, capacitors, and high-k dielectrics; critical for next-generation chips and memory devices. |
| Aerospace & Defense | Preparation of hafnium-based alloys for high-temperature, corrosion-resistant components and thermal-resistant coatings. |
| Chemical Industry | Intermediate for hafnium compounds, catalyst production, and specialty chemical processes. |
| Metallurgy | Alloying processes for hafnium-containing superalloys, enhancing mechanical properties and thermal stability. |
| Research & Development | Essential for materials science, high-temperature chemistry, and nanotechnology research. |
Specifications
| Parameter | Details |
|---|---|
| Scientific Name | Hafnium Tetrachloride |
| Chemical Formula | HfCl₄ |
| CAS Number | 10026-06-7 |
| Molar Mass | 210.68 g/mol |
| Appearance | White to pale yellow crystalline solid |
| Purity / Chemical specification | |
| Purity (HfCl₄) | 99.9% |
| Zirconium (Zr) | 0.07% |
| Titanium (Ti) | <0.001% |
| Silicon (Si) | <0.003% |
| Iron (Fe) | 0.003% |
| Aluminum (Al) | <0.001% |
| Phosphorus (P) | <0.005% |
| IHf** | 53.65% |
| Melting Point | 432 °C (sublimes) |
| Boiling Point | Sublimes at 432 °C |
| Density | 3.63 g/cm³ |
| Solubility | Soluble in organic solvents; reacts with water to form HfO₂ and HCl |
| Physical Form | Crystalline powder or granules |
Why Choose Our Hafnium Tetrachloride (HfCl₄)?
- High reactivity for chemical synthesis and production of HfO₂ and hafnium compounds.
- Extremely low impurities ensuring reliable dielectric and metallurgical performance.
- Versatile industrial applications in semiconductors, aerospace, defense, and R&D.
- Thermally stable for high-temperature processing in controlled environments.
- Global supply and technical support from a trusted, experienced supplier.
Ordering Information
- Form: High-purity crystalline powder or granules
- Purity: ≥ 99%
- Packaging: Vacuum-sealed, moisture-resistant containers
- Quantity: Bulk orders available; customizable quantities
- Delivery: Worldwide supply with technical support
Request a Quote
We’re here to support your business needs worldwide. Reach out to us today.
Our Locations
Registered Office:
HD-071, 5th Floor, WeWork, DLF Two Horizon Centre,
Sector 43, DLF City Phase-5,
Gurugram, Haryana – 122002, India
Warehouse Address:
Plot No. 46/17/2 (Min), 24/1, 24/2, 49/3/2, 4/1 & 4/2,
Village Garhi Harsaru,
Gurugram (Gurgaon), Haryana – 122505, India
Call Us
+91 81785 07903
