Hafnium Oxide (HfO₂)
🧪 Hafnium Oxide (HfO₂) – High-Purity Advanced Ceramic Material
Our Hafnium Oxide (HfO₂) is a high-purity, high-performance ceramic material widely used in aerospace, nuclear, microelectronics, optics, and advanced materials research. HfO₂ is a refractory oxide notable for its extremely high melting point, thermal stability, chemical inertness, and excellent electrical insulating properties.
Key Features & Benefits
- Ultra-High Purity: HfO₂ + ZrO₂ ≥ 99.3%, extremely low impurities.
- Thermally Stable: Melting point 2800 °C ensures performance under extreme heat.
- Chemically Inert: Resistant to acids, alkalis, and high-temperature oxidation.
- High Dielectric Constant: Ideal for microelectronics and semiconductor applications.
- Versatile Form: Powder suitable for ceramics, coatings, thin films, and chemical synthesis.
Applications
- Nuclear Industry: Control rods, fuel rod coatings, and high-temperature resistant materials; excellent neutron absorption and chemical stability.
- Microelectronics & Semiconductors: High-k dielectric for MOSFETs, capacitors, thin-film transistors, and next-generation memory devices.
- Aerospace & Defense: Thermal-resistant coatings for turbine blades, hypersonic vehicles, and spacecraft components.
- Optical & Fiber-Optic Industry: Component for specialized glass, lenses, lasers, and high-precision optical coatings.
- Research & Advanced Materials: Nanotechnology, ceramics, high-temperature experiments, and chemical synthesis.
Specifications
| Parameter | Details |
|---|---|
| Scientific Name | Hafnium Oxide |
| Chemical Formula | HfO₂ |
| CAS Number | 12055-23-1 |
| Molar Mass | 210.49 g/mol |
| Appearance | White to off-white crystalline powder |
| Density | 9.68 g/cm³ |
| Melting Point | 2800 °C |
| Boiling Point | 5400 °C |
| Crystal Structure | Monoclinic (stable at room temperature) |
| Thermal Expansion Coefficient | 5.9 × 10⁻⁶ /K |
| Dielectric Constant | ~25 at 1 kHz |
| Refractive Index | 1.95 – 2.05 |
| Chemical Stability | Insoluble in water, resistant to most acids and alkalis |
| Purity | HfO₂ + ZrO₂: 99.9% |
| ZrO₂: 0.14% | |
| SiO₂: 0.0063% | |
| Fe₂O₃: 0.0048% | |
| Al₂O₃: 0.0048% | |
| TiO₂: 0.0113% | |
| MgO: 0.0021% | |
| CaO: 0.0059% | |
| LOI (Loss on Ignition): 0.06% | |
| Mass fraction of ignition loss: <84% | |
| Hf content: <84% | |
| Form | High-purity powder |
| Packaging | Vacuum-sealed, corrosion-resistant bags for safe transport |
Why Choose Our Hafnium Oxide (HfO₂)?
- Exceptional heat resistance for aerospace and industrial applications.
- Reliable chemical stability in extreme environments.
- High dielectric constant and insulating properties for microelectronics.
- Versatile usage: film coatings, optical applications, fiber-optic glass, ceramics.
- Manufactured to strict quality standards for high-tech industrial use.
Ordering Information
- Form: High-purity powder
- Purity: HfO₂ + ZrO₂ ≥ 99.3%
- Packaging: Vacuum-sealed, corrosion-resistant bags
- Custom Quantities: Available upon request
- Delivery: Worldwide industrial supply with technical support
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